ENEL491-19S1 (C) Semester One 2019

Nano Engineered Electronic Devices

15 points

Details:
Start Date: Monday, 18 February 2019
End Date: Sunday, 23 June 2019
Withdrawal Dates
Last Day to withdraw from this course:
  • Without financial penalty (full fee refund): Friday, 1 March 2019
  • Without academic penalty (including no fee refund): Friday, 10 May 2019

Description

Micro- and nano-electronic device design and fabrication technology. Physics of electronic materials. Advanced semiconductor devices. Solar cells design and fabrication. Future trends in nanoelectronics.

Topic covered include:

Device Structures and Processing
     Diffusion and ion implantation
     Oxidation
     Photolithography and metallisation

Introduction to nano science and engineering
     Top down and bottom up technologies
     Emerging Applications of nanoscale devices

Solar Cell  Design and Fabrication
     Design consideration and structures of solar cells
     Fabrication process for solar cells
     Applications of PV systems

Quantum mechanics and devices
     2D structures such as quantum wells,
     1D quantum dots for optical devices and HEMTs,    
     GaN and AlGaN structures for blue LEDs and lasers,
     An introduction to graphene,
     A basic introduction to simple quantum mechanics concepts in electronic devices – leading to the idea of “More than Moore”

New Semiconductor Materials - Growth and Characterization
     Thin Film Semiconductor Growth (new materials)
     Semiconductor Nanostructure Growth
     Semiconductor Microscopy Techniques
     Electrical Characterisation Techniques
     Optical Characterisation Techniques
     X-ray based Spectroscopy

Micro- and Nanofluidics
     What is Microfluidics? Origins, Markets, Challenges, Platforms
     Fluid Properties - Fluids, Dispersion, Concentration, Solubility
                                     Osmosis, Diffusion, Viscosity, Surface Tension
     Fluid Dynamics - The momentum equation, Interpretation of the Navier
                                     Stokes equation, Characteristics of flow in
                                     microfluidics (Re-number), Examples of laminar flow
     Fabrication Technology - Silicon, Glass, Paper, Polymers, Soft-
                                     lithography
     Applications - Commercial PDMS Devices, C. elegans Force Sensing,
                                     Dissolved Oxygen Control
     Nanofluidics - What is Nanofluidics? Double Layers, Debye Length,
                                     Nanofluidic Devices, Example: Nanopores

Learning Outcomes

  • This course aims to equip students with advanced knowledge of electronic materials and devices, as well as a fundamental understanding of advanced semiconductor device design and processing techniques, including solar cell design and fabrication, integrated circuit design, lithography and pattern definition technologies, and introduction to emerging micro- and nanoscale devices.

    Outcomes include:
  • Give students an understanding of the main processing technologies for electronic devices.
  • Understand the range and types of semiconductor materials used in electronic devices and their applications.
  • Be familiar with the new and future devices based on recent findings and research in this field.
  • Understand, design and analyse typical silicon based solar cells.
  • Understand  the principle behind quantum mechanics and devices
  • Understand and analyse microfluidic devices and their applications in bioengineering.
  • Be introduced to the principles of nanotechnology and nanoscience.
  • Be familiar with emerging semiconductor material and devices used for optoelectronics applications (LEDs, UV detection, power diodes).

Prerequisites

ENCE362 or ENEL373 or ENEL372

Restrictions

ENEL435, ENEL672

Course Coordinator

Maan Alkaisi

Lecturer

Volker Nock

Assessment

Assessment Due Date Percentage 
Assignment 1 20%
Lab Report 30%
Scientific Paper 25%
Assignment 2 25%

Textbooks / Resources

Recommended Reading

Campbell, Stephen A; The science and engineering of microelectronic fabrication ; 2nd ed; Oxford University Press, 2001.

Geschke, Oliver. , Klank, Henning., Telleman, Pieter; Microsystem engineering of lab-on-a-chip devices ; 2nd rev. and enl. ed; Wiley-VCH, 2008.

May, Gary S. , Sze, S. M; Fundamentals of semiconductor fabrication ; Wiley international ed; Wiley, 2004.

Indicative Fees

Domestic fee $1,080.00

International fee $5,250.00

* All fees are inclusive of NZ GST or any equivalent overseas tax, and do not include any programme level discount or additional course-related expenses.

Limited Entry Course

Maximum enrolment is 60

For further information see Electrical and Computer Engineering .

All ENEL491 Occurrences

  • ENEL491-19S1 (C) Semester One 2019